Energy study of buckled micromachined beams for thin-film stress measurements applied to SiO2

Citation
L. Nicu et al., Energy study of buckled micromachined beams for thin-film stress measurements applied to SiO2, J MICROM M, 9(4), 1999, pp. 414-421
Citations number
23
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
ISSN journal
09601317 → ACNP
Volume
9
Issue
4
Year of publication
1999
Pages
414 - 421
Database
ISI
SICI code
0960-1317(199912)9:4<414:ESOBMB>2.0.ZU;2-H
Abstract
Measurements of maximal deflection amplitude were carried out on arrays of clamped-clamped SiO2 microfabricated beams buckling under the effect of thi n-film built-in compressive stress. The experimental deflection determinati on of these deflections yields the residual stress value in the SiO2 film. This proposal is confirmed by appropriate theory that considers the issue o f microfabricated beam buckling from an energy point of view. In this model , the total potential energy stored in a buckled microbeam is computed and the residual stress value is given by considering the measured buckling max imal deflection and by making approximations about the shape of the microbe am deflection curve. The SiO2 film residual stress evaluated with the help of the energy method is in good agreement with values reported in the liter ature.