Simulation of damage production and accumulation in vanadium

Citation
E. Alonso et al., Simulation of damage production and accumulation in vanadium, J NUCL MAT, 276, 2000, pp. 221-229
Citations number
41
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
JOURNAL OF NUCLEAR MATERIALS
ISSN journal
00223115 → ACNP
Volume
276
Year of publication
2000
Pages
221 - 229
Database
ISI
SICI code
0022-3115(20000101)276:<221:SODPAA>2.0.ZU;2-K
Abstract
Energetic atoms which have been knocked-off their lattice sites by neutron or ion irradiation leave a trail of vacancies and interstitials in their wa ke. Most of these defects recombine with their opposites within their own c ollision cascade. Some fraction, however, escape to become freely migrating defects (FMD) in the bulk of the material. The interaction of FMD with the microstructure has long been linked to changes in the macroscopic properti es of materials under irradiation. We calculate the fraction of FMD in pure vanadium for a wide range of temperatures and primary knock-on atom (PKA) energies. The collision cascade database is obtained from molecular dynamic s (MD) simulations with an embedded atom method (EAM) potential. The actual FMD calculation is carried out by a kinetic Monte Carlo (kMC) code with a set of parameters extracted either from the experimental literature or from MD simulations. Annealing each individual cascade at different temperature s allows the mobile species to escape and account for FMD. We also analyze damage accumulation in a specimen irradiated at low dose rate in the presen ce of impurities. At the temperature studied, beginning of stage V, we obse rve that only vacancies are free to move whereas most interstitials are sto pped by impurities. We also analyze the role of impurities on damage accumu lation and on the concentration of mobile defects. (C) 2000 Published by El sevier Science B.V. All rights reserved.