The photoemission electron microscope (PEEM) based techniques micro-near-ed
ge X-ray absorption fine structure (mu-NEXAFS) and micro-photoelectron spec
troscopy (mu-PES) have been recently installed at the BESSY-I HE-TGM beam l
ines as novel techniques for material analyses. In the PEEM microscope, pho
toemitted electrons are imaged by electrostatic lenses having a lateral res
olution of 40 nm. Images with a field of view between 800 and 20 mu m are o
btained. NEXAFS enables the simultaneous recording of the near-edge fine st
ructures of the absorption coefficient while varying the incident photon en
ergy. For mu-PES, at a fixed photon energy, core level and valence band spe
ctra can be recorded by an electrostatic energy analyser to fit in the opti
cal axis of the PEEM microscope. Spectra are recorded by analysing all the
electrons of the PEEM image or by selecting segments of the image with a co
ntinuous iris aperture. The minimum size of the analysed spot is in the ord
er of a few micrometers. Here, we use these techniques to determine the ele
ctronic structure of polypyrrole films within a well defined surface area.
We found surface structures of such polypyrrole films which are corrugated
in the micron range as well as areas that appear almost smooth. In addition
, the PEEM microscope gives patterns due to a non-homogeneous surface poten
tial distribution. In such patterns bright irregular stripes appear between
dark patches. The stripes have a typical width in the order of several mic
rometers. (C) 1999 Elsevier Science S.A. All rights reserved.