Preparation of perovskite structure K(Ta0.65Nb0.35)O-3 films by pulsed laser deposition on Si substrates

Authors
Ma, WD Zhao, ZS Wang, SM Zhang, DM Xu, DS Wang, XD Chen, ZJ
Citation
Wd. Ma et al., Preparation of perovskite structure K(Ta0.65Nb0.35)O-3 films by pulsed laser deposition on Si substrates, PHYS ST S-A, 176(2), 1999, pp. 985-990
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
176
Issue
2
Year of publication
1999
Pages
985 - 990
Database
ISI
SICI code
0031-8965(199912)176:2<985:POPSKF>2.0.ZU;2-G
Abstract
Highly oriented and perovskite structure KTN (potassium tantalate-niobate) thin films were fabricated by pulsed laser deposition technique on Si(100) substrates. The surface of the thin films is homogeneous, crack-free and de nse. The ferroelectric measurement was carried out on metal-ferroelectric-m etal capacitors and the remanent polarization and the coercive field were 8 .66 mu C/cm(2) and 7.44 kV/cm, respectively. The effects of the substrate t emperature, laser energy density on the target and oxygen pressure during t he deposition process on the structure of thin films were discussed.