U parameter of the Mott-Hubbard insulator 6H-SiC(0001)-(root 3 x root 3)R30 degrees: An ab initio calculation

Citation
M. Rohlfing et J. Pollmann, U parameter of the Mott-Hubbard insulator 6H-SiC(0001)-(root 3 x root 3)R30 degrees: An ab initio calculation, PHYS REV L, 84(1), 2000, pp. 135-138
Citations number
20
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
84
Issue
1
Year of publication
2000
Pages
135 - 138
Database
ISI
SICI code
0031-9007(20000103)84:1<135:UPOTMI>2.0.ZU;2-8
Abstract
The 6H-SiC(0001)-(root 3 X root 3)R30 degrees surface exhibits one half-fil led localized dangling-bond orbital per surface unit cell. Its electronic s tructure can accurately be described as a Mott-Hubbard insulator. We invest igate its spectrum by a spin-polarized ab initio quasiparticle calculation. The resulting band structure shows one occupied and one empty surface band , separated by a direct band gap of 1.95 eV. Since the band gap in the spec trum of the Hubbard model is directly given by the on-site Coulomb-interact ion parameter U of the dangling-bond orbital, our results allow for a relia ble determination of U = 1.95 eV.