The oxidation of metol (N-methyl-p-aminophenol) in aqueous solution by mean
s of a UV/H2O2 system has been studied in the pH range 3.0-9.0. The results
of the present investigation indicate that the pH, H2O2 and substrate conc
entration and oxygen presence significantly influence the system behaviour.
Toxicity tests show that the H2O2 photolytic process is capable of reducin
g the toxicity of metol aqueous solutions. The kinetic constant of the atta
ck of HO radicals to the substrate has been also estimated through the adop
tion of a simplified model. (C) 1999 Elsevier Science Ltd. All rights reser
ved.