Effect of high-temperature treatment on the crystallization of CNx thin films

The amorphous carbon nitride films were prepared by de magnetron sputtering first, and then were heat-treated at high temperature. DTA, XRD, Auger spe ctroscopy were used to study the difference of composition, structure befor e and after heat-treatment. The results showed that crystallization occurre d at 1186 degrees C. Heat-treatment: can induce the crystallization of carb on nitride and the diffraction peaks appeared in the XRD pattern. The resul ts of Auger spectroscopy also showed that: there existed SiCN-riched area a nd the content of N decreased.