Pulsed laser deposition of carbon nitride films by a sub-ps laser

CNx (0.01 < x < 0.06) films were grown from a graphite target by pulsed las er deposition in a low-pressure nitrogen environment at room temperature, u sing a sub-ps ultraviolet laser. With increasing nitrogen pressure from 3 x 10(-2) to 0.6 mbar the nitrogen content of the films increases monotonousl y, as determined by X-ray photoelectron spectroscopy. Raman spectroscopy re veals that the films consist predominantly of highly amorphous carbon.