A fused hollow cathode (FHC) plasma source is introduced. The system of rad
io-frequency (rf) generated hollow cathodes with flowing gas forms an integ
rated electrode source which operates in the pressure range from 1 Torr to
atmospheric pressure. The diameter of the source is 3.5 cm. However, the co
nstruction perfectly enables further scaling up. The forward rf power to su
stain the discharge at atmospheric pressure can be as low as 2 W. The disch
arge is stable, volume filling, silent, with no streamers. The FHC atmosphe
ric plasma source is very promising for surface processing, specially on te
mperature sensitive substrates, and may substantially save costs by avoidin
g investments into the vacuum equipment. (C) 2000 American Institute of Phy
sics. [S0003-6951(00)01003-2].