Formation of local p(+) region in ZnSe by Cu3Ge contact

Citation
Sj. Chang et al., Formation of local p(+) region in ZnSe by Cu3Ge contact, ELECTR LETT, 35(25), 1999, pp. 2231-2232
Citations number
6
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
ELECTRONICS LETTERS
ISSN journal
00135194 → ACNP
Volume
35
Issue
25
Year of publication
1999
Pages
2231 - 2232
Database
ISI
SICI code
0013-5194(199912)35:25<2231:FOLPRI>2.0.ZU;2-T
Abstract
Cu3Ge/Pt/Au has been deposited onto the surface of p-ZnSe, n(+)-ZnSe and n- ZnSe. It was found that the observed Cu3Ge/pZnSe ohmic behaviour is due mai nly to hole tunnelling through the metal/semiconductor interface. A p(+)-n junction-like I-V characteristic for Cu3Ge/n-ZnSe was also observed. Furthe rmore, a negative differential resistance with a peak-to-valley ratio of si milar to 6 was observed under forward bias when Cu3Ge was deposited onto,n( +)-ZnSe. These observations all suggest that Cu3Ge can form a local p(+) re gion on the ZnSe surface.