A long pulse discharge excited ArF laser

Citation
L. Feenstra et al., A long pulse discharge excited ArF laser, IEEE S T QU, 5(6), 1999, pp. 1515-1521
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
ISSN journal
1077260X → ACNP
Volume
5
Issue
6
Year of publication
1999
Pages
1515 - 1521
Database
ISI
SICI code
1077-260X(199911/12)5:6<1515:ALPDEA>2.0.ZU;2-W
Abstract
An X-ray preionised, discharge excited ArF excimer laser, lambda = 193 nm, has been studied in the long pulse regime. The laser performance is found t o be primarily dependent on the discharge stability, and therefore, on the gas composition, preionization timing and the pumping power. Using X-ray pr eionization and prepulse-mainpulse excitation, laser pulselengths of up to 120-ns full-width at half-maximum at 4 mJ/l are obtained by decreasing the partial pressures of the active ingredients, F-2 and Ar, and using Ne as a buffergas. This is almost six times as long as usual for discharge excited ArF lasers.