Compact and comprehensive database for ion-implanted as profile

Authors
Suzuki, K Sudo, R Feudel, T Fichtner, W
Citation
K. Suzuki et al., Compact and comprehensive database for ion-implanted as profile, IEEE DEVICE, 47(1), 2000, pp. 44-49
Citations number
15
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
47
Issue
1
Year of publication
2000
Pages
44 - 49
Database
ISI
SICI code
0018-9383(200001)47:1<44:CACDFI>2.0.ZU;2-Q
Abstract
We succeeded in explaining dose dependent As ion implantation profiles with a Monte Carlo simulation, and extracted parameters for our proposed analyt ical profile model from the systematic Monte Carlo data. We proposed a comp act database to cover energy, dose, rotation, cover oxide thickness depende nce.