Reactive ion etching for the production of metal microstructures by hot embossing

Authors
Roetting, O Heckele, M Bacher, W
Citation
O. Roetting et al., Reactive ion etching for the production of metal microstructures by hot embossing, MICROSYST T, 6(1), 1999, pp. 11-14
Citations number
2
Categorie Soggetti
Instrumentation & Measurement
Journal title
MICROSYSTEM TECHNOLOGIES
ISSN journal
09467076 → ACNP
Volume
6
Issue
1
Year of publication
1999
Pages
11 - 14
Database
ISI
SICI code
0946-7076(199911)6:1<11:RIEFTP>2.0.ZU;2-Y
Abstract
A reactive ion etching process which has been developed in order to remove the residual polymer layer, that remains at the bottom of microstructures m ade by hot embossing, is described. The influence of parameters and structu res is explained.