Z. Falkenstein, Ozone formation with (V)UV-enhanced dielectric barrier discharges in dry and humid gas mixtures of O-2, N-2/O-2, and Ar/O-2, OZONE-SCI E, 21(6), 1999, pp. 583-603
The effect of (V)UV illumination at 172 nm and 253.7 nm on ozone formation
with dielectric barrier discharges in air-like mixtures of nitrogen/oxygen
and argon/oxygen as function of the water concentration is presented. Altho
ugh (V)UV at these wavelengths efficiently cleaves ozone, the ozone concent
ration in a combined (V)UV/dielectric barrier discharge in oxygen-containin
g gases is reduced only very little. This corresponds to an enhanced concen
tration of atomic singlet oxygen, which, in presence of water, increases th
e production of hydroxyl radicals. This is confirmed by measurements of the
removal rates of 2-propanol and of its byproducts in dry and humid air in
a combined (V)UV/dielectric barrier discharge treatment.