Atomic layering at the liquid silicon surface: A first-principles simulation

Citation
G. Fabricius et al., Atomic layering at the liquid silicon surface: A first-principles simulation, PHYS REV B, 60(24), 1999, pp. R16283-R16286
Citations number
37
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
24
Year of publication
1999
Pages
R16283 - R16286
Database
ISI
SICI code
0163-1829(199912)60:24<R16283:ALATLS>2.0.ZU;2-U
Abstract
We simulate the liquid silicon surface with first-principles molecular dyna mics in a slab geometry. We find that the atom-density profile presents a p ronounced layering, similar to those observed in low-temperature liquid met als like Ga and Hg. The depth-dependent pair correlation function shows tha t the effect originates from directional bonding of Si atoms at the surface , and propagates into the bulk. The layering has no major effects in the el ectronic and dynamical properties of the system, that are very similar to t hose of bull; liquid Si. To our knowledge, this is the first study of a liq uid surface by first-principles molecular dynamics. [S0163-1829(99)50648-6] .