Identification of key parameters by comparing experimental and simulated growth of vapor-deposited amorphous Zr65Al7.5Cu27.5 films

Citation
Sg. Mayr et al., Identification of key parameters by comparing experimental and simulated growth of vapor-deposited amorphous Zr65Al7.5Cu27.5 films, PHYS REV B, 60(24), 1999, pp. 16950-16955
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
24
Year of publication
1999
Pages
16950 - 16955
Database
ISI
SICI code
0163-1829(199912)60:24<16950:IOKPBC>2.0.ZU;2-F
Abstract
Scanning tunneling microscopy growth studies on vapor-deposited amorphous Z r65Al7.5Cu27.5 films are analyzed to identify the dominant surface structur e forming mechanisms. Qualitative and-concerning the scaling behavior of su rface roughness and height-difference-correlation functions-also quantitati ve agreement of the experimental results with numerical simulations of a Mo nte Carlo model and a continuum model can be achieved. Curvature-induced su rface diffusion, adatom concentration triggered surface diffusion, and geom etrical effects can be identified to be the key parameters for the experime ntally observed surface morphology. Some discrepancies, especially in the l ate stages of growth, remain, but can be explained qualitatively by additio nal effects, such as tip convolution or by the limitations of the approxima tions in the model assumptions. [S0163-1829(99)15247-0].