Deposition of high fluorine content macromolecular thin layers under continuous-flow-system corona discharge conditions

High fluorine content macromolecular layers were deposited on polyethylene (PE) film surfaces under an originally designed, continuos-flow-system plas ma reactor conditions. Survey and angle resolution, ESCA data and ATR-FTIR results indicate that the plasma-created films are thin and have a fairly u niform structure. The fluorinated layers have a 60% relative fluorine atomi c concentration, and are mainly composed of CF2-CF, and C-CF3 groups. AFM i mages collected from virgin and plasma-exposed PE surfaces show a significa ntly rougher surface of the plasma-treated substrates. Applications can be envisaged for creating Telfon-like coatings on various polymeric film surfa ces using a continuous plasma process.