We report the fabrication and characterization of AlxGa1-xN photodiodes (x
similar to 0.70) grown on sapphire by low-pressure metalorganic chemical va
por deposition. The peak responsivity for -5 V bias is 0.11 A/W at 232 nm,
corresponding to an internal quantum efficiency greater than 90%. The devic
e response drops four orders of magnitude by 275 nm and remains at low resp
onse for the entire near-ultraviolet and visible spectrum. Improvements wer
e made to the device design including a semitransparent Ni/Au contact layer
and a GaN:Mg cap layer, which dramatically increased device response by en
hancing the carrier collection efficiency. (C) 2000 American Institute of P
hysics. [S0003-6951(00)01204-3].