Highly oriented V2O5 nanocrystalline thin films by plasma-enhanced chemical vapor deposition

Plasma-enhanced chemical vapor deposition of vanadium pentoxide thin films from a vanadyl(IV) beta-diketonate compound has been performed in a low-pre ssure reactor under different operating conditions. The effect of various p arameters, such as the: flow rates of the carrier and reactive gas and the substrate temperatures, on films composition, microstructure, and morpholog y was investigated in detail. Controlled variations of the synthesis condit ions allowed a fine modulation of the sample properties, as shown by XRD an d AFM analyses. In particular, at 200 degrees C and moderate oxygen flow, n anophasic V2O5 with a strong (001) preferential orientation could be easily obtained. The composition and purity of the films are studied by XPS and S IMS analyses, with special regard to film-substrate interdiffusion phenomen a. Optical properties of the films are also investigated.