A mixed film of microscopic heterogeneity was formed by stepwise deposition
of a long-chain organosilane n-octadecyltrichlorosilane (OTS) and a short-
chain organosilane aminobutyldimethylmethoxysilane (ABS). The amount of sil
ane deposited on an oxidized silicon substrate was controlled kinetically b
y varying the dip time in each silane solution. The binary film was charact
erized by the atomic force microscopy (AFM), infrared attenuated total inte
rnal reflection (IR-ATR), and contact angle goniometry. OTS forms a monolay
er structure whose fractional surface coverage and surface energy can be pr
ecisely controlled. ABS agglomerates slowly to form island structure and is
ineffective in surface energy or composition variation. The contact angles
on sub-monolayers of OTS follows the Cassie equation, while the contact an
gle of the binary OTS and ABS film deviates positively from the equation. (
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