Ls. Wang et al., SI3OY (Y=1-6) CLUSTERS - MODELS FOR OXIDATION OF SILICON SURFACES ANDDEFECT SITES IN BULK OXIDE MATERIALS, Physical review letters, 78(23), 1997, pp. 4450-4453
We studied the structure and bonding of a series of silicon oxide clus
ters, Si3Oy (y = 1-6), using anion photoelectron spectroscopy and ab i
nitio calculations. For y = 1-3 the clusters represent the sequential
oxidation of Si-3, and provide structural models for the oxidation of
silicon surfaces. For y = 4-6, the clusters contain a central Si in a
tetrahedral bonding environment, suggesting the onset of the bulklike
structure. Evidence is presented that suggests the Si3O4 cluster (D-2d
) may provide a structural model for oxygen-deficient defect sites in
bulk SiO2 materials.