Stress-dependent surface reactions and implications for a stress measurement technique

Authors
Citation
Hh. Yu et Z. Suo, Stress-dependent surface reactions and implications for a stress measurement technique, J APPL PHYS, 87(3), 2000, pp. 1211-1218
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
3
Year of publication
2000
Pages
1211 - 1218
Database
ISI
SICI code
0021-8979(20000201)87:3<1211:SSRAIF>2.0.ZU;2-W
Abstract
In contact with an environment, a solid may gain or lose mass due to, for e xample, deposition or etching. As the reaction proceeds, the surface of the solid moves, either extending or receding. If the solid is under stress, t he elastic energy adds to the driving force of the reaction, and may cause the surface to roughen. This phenomenon has recently led to a novel experim ental technique to determine the stress state in a solid by using an atomic force microscope to scan the surface profiles before and after etching. St ress is also known to change the mobility of a reaction. By this mechanism, the stress may either roughen or stabilize a flat surface. This article de scribes a linear perturbation analysis of a three-dimensional solid surface evolving under stress, using a general kinetic law. It is found that when the reaction is near equilibrium, the stress effect on driving force domina tes; when the reaction is far from equilibrium, the stress effect on mobili ty dominates. Under these two conditions, the surface profile spectra have different patterns and length scales. The implications for the stress measu rement technique are discussed. It is suggested that the same experimental procedure be used to measure surface energy and activation strains. (C) 200 0 American Institute of Physics. [S0021-8979(00)04303-6].