Al. Cabrera et al., RESISTANCE CHANGE OF COBALT AND NIOBIUM FILMS WHEN EXPOSED TO HYDROGEN AND CARBON-MONOXIDE, Physical review. B, Condensed matter, 55(20), 1997, pp. 13999-14004
The resistance of thin cobalt and niobium films was monitored during 1
000 s exposures to hydrogen or carbon monoxide at a fixed pressure (10
(-6) torr) and also during their removal. Upon an adsorption-desorptio
n cycle the resistivity changed in a ''sawtooth'' fashion, similar to
the changes previously observed in niobium foils. The resistivity incr
ease by the adsorbed gas seems to be directly related to weakly adsorb
ed states on the surface. The magnitude of the resistivity changes due
to gas adsorption is related to the surface roughness of the film.