Thickness-dependent electrical properties of Pb(Zr, Ti)O-3 thin film capacitors for memory device applications

Citation
Tk. Kundu et Jym. Lee, Thickness-dependent electrical properties of Pb(Zr, Ti)O-3 thin film capacitors for memory device applications, J ELCHEM SO, 147(1), 2000, pp. 326-329
Citations number
19
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
147
Issue
1
Year of publication
2000
Pages
326 - 329
Database
ISI
SICI code
0013-4651(200001)147:1<326:TEPOPT>2.0.ZU;2-4
Abstract
Lead zirconate titanate [Pb(Zr0.53Ti0.47)O-3] films of thickness ranging fr om 70 to 680 nm have been prepared by the radio-frequency sputtering techni que. The current density-electric field (J-E characteristics of the films w ere investigated. Films with thicknesses above 280 nm show a varistor-type J-E characteristic. This behavior is due to the presence of highly resistiv e grain boundaries and is termed a "grain boundary limited conduction mecha nism". For films with thicknesses lower than 280 nm, trap-controlled space charge limited current is dominant. In this case, the dominance of the deep traps in the conduction mechanism has been confirmed from the temperature dependence of the J-E behavior (C) 2000 The Electrochemical Society. S0013- 4651 (99)01-002-1. All rights reserved.