Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition

Amorphous hydrogenated carbon thin films have been deposited from benzene v apor in an electron cyclotron resonance plasma-enhanced chemical vapor depo sition reactor. The effects of gas flow rate, pressure, and microwave power on deposition rates, chemical structure and composition, and on film densi ty were investigated. Plasma enhanced dissociation and ionization reactions were monitored by mass spectrometry and by optical emission spectroscopy. Dissociation products included a variety of unsaturated hydrocarbon species (primarily ethylene) and hydrogen. Deposited films were characterized by F ourier transform infrared spectroscopy, Raman spectroscopy, and fluorescenc e spectroscopy. Films displayed a condensed, aromatic, hydrocarbon-like str ucture, albeit without extensive conjugation. Possible reaction sequences l eading to the observed film structures have been proposed. (C) 2000 America n Vacuum Society. [S0734-2101(00)00601-1].