Chemical vapor deposition of pyrolytic boron nitride from borazine

The chemical vapor deposition of pyrolytic boron nitride from borazine (the B3N3H6-N-2 system) in the temperature range of 1300-1800 degrees C and cha mber pressures of 1-10 Torr has been studied using a cold-wall reactor. The density, phase composition and B/N ratio of the samples (0.2-0.8 mm thick) have been measured. The deposition process from borazine is controlled by diffusion and produces stoichiometric boron nitride with a high fraction of the hexagonal phase of boron nitride in the samples. Employing borazine as a precursor reduces the temperature of formation of h-BN in comparison wit h the well-known BCl3-NH3-N-2 system. (C) 2000 American Vacuum Society. [S0 734-2101(00)03301-7].