The polycrystalline La1 - xMnO3 - delta films were grown on Si substrates b
y organometallic deposition (MOD) method. Self-grown alpha-SiO2 was used as
buffer layer. The magnetization, electrical resistivity and magnetoresista
nce of films were investigated at temperatures ranging from 5 to 298 K. All
La1 - xMnO3 - delta films showing insulator-metal (I - M) transitions exhi
bited semiconductor behavior for T > T-p. Magnetic property was strongly af
fected by experimental parameters. The MR variations were correlated to mic
rostructure. A low field MR of similar to 13% at 2 EOe was observed. (C) 19
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