UV-induced permanent gratings in sol-gel germanosilicate thin films

Citation
Ad. Razafimahatratra et al., UV-induced permanent gratings in sol-gel germanosilicate thin films, OPT MATER, 13(4), 2000, pp. 439-448
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
OPTICAL MATERIALS
ISSN journal
09253467 → ACNP
Volume
13
Issue
4
Year of publication
2000
Pages
439 - 448
Database
ISI
SICI code
0925-3467(200001)13:4<439:UPGISG>2.0.ZU;2-S
Abstract
Germanosilicate thin films have been elaborated by the sol-gel process and the dip-coating technique. Pulsed or continuous wave UV laser (244 nm) was used to write permanent gratings in these films. In the case of exposure to cw laser, the grating diffraction efficiencies were measured using a focus ed beam from a He-Ne laser at 633 nm and photoinduced changes in refractive index as high as 4 x 10(-3) have been obtained. The thermal behaviour of t hese gratings has been investigated showing a good stability up to 400 degr ees C. Exposure to pulsed fringe pattern led to a glass photo-expansion mod ulated by a strong corrugation which can be due mainly to photo-ablation at the places of the bright fringes. The waveguide surface at the grating pla ces was investigated through Atomic Force Microscopy (AFM) and microscopic profilometry techniques. Preliminary results on the kinetics of the grating growths are also reported. (C) 2000 Elsevier Science B.V.. All rights rese rved.