The negatively charged insulator-semiconductor structure: concepts, technological considerations and applications

Authors
Citation
D. Konig et G. Ebest, The negatively charged insulator-semiconductor structure: concepts, technological considerations and applications, SOL ST ELEC, 44(1), 2000, pp. 111-116
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
1
Year of publication
2000
Pages
111 - 116
Database
ISI
SICI code
0038-1101(200001)44:1<111:TNCISC>2.0.ZU;2-0
Abstract
The use of possibly uncharged and therefore passivated Insulator-Semiconduc tor structures (IS-structures) in conventional semiconductor devices as MIS FETs is well known and has been an issue of many research papers. For drift field generation IS structures with a fixed positive interface charge in t he insulator were developed in the 80 s and employed mainly as a part of fi eld effect solar cells. While there has been a large number of publications about the positively biased IS structure there has been very little intere st in its antipolar counterpart - the negatively biased IS structure - so f ar. In this paper we introduce theoretical considerations and qualitative m odels how such a structure would look and work like. Furthermore we conside r technological aspects of producing a negatively biased IS structure. Poss ible applications are discussed as well.(C) 2000 Elsevier Science Ltd. All rights reserved.