Preparation of single phase tungsten carbide by annealing of sputtered tungsten-carbon layers

Citation
H. Romanus et al., Preparation of single phase tungsten carbide by annealing of sputtered tungsten-carbon layers, THIN SOL FI, 359(2), 2000, pp. 146-149
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
359
Issue
2
Year of publication
2000
Pages
146 - 149
Database
ISI
SICI code
0040-6090(20000131)359:2<146:POSPTC>2.0.ZU;2-6
Abstract
Tungsten carbide layers were prepared by sputtering from a stoichiometric W C target and subsequent annealing. Carbide formation was found at temperatu res above 800 degrees C. Annealing in pure hydrogen ambient results in a ca rbon depletion in the layers and the formation of a dominant W2C phase. We demonstrate that propane added to the annealing ambient stimulates a transf ormation of the tungsten-carbon layers to a stoichiometric WC phase. The va riation of the propane concentration allows a continuously alteration of th e layer structure between single phase WC and a mixed layer with dominant W 2C and the adjustment of different values of the electrical resistance and the optical constants. (C) 2000 Elsevier Science S.A. All rights reserved.