Comparative study of CdS thin films deposited by single, continuous, and multiple dip chemical processes

Citation
Io. Oladeji et al., Comparative study of CdS thin films deposited by single, continuous, and multiple dip chemical processes, THIN SOL FI, 359(2), 2000, pp. 154-159
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
359
Issue
2
Year of publication
2000
Pages
154 - 159
Database
ISI
SICI code
0040-6090(20000131)359:2<154:CSOCTF>2.0.ZU;2-3
Abstract
We have used Rutherford backscattering spectrometry (RBS), X-ray diffractio n (XRD), Raman, and photoconductivity to characterize CdS thin films grown by single, continuous, and multiple dip chemical processes. XRD has further shown, without ambiguity, that grown CdS films, independent of the process , in an almost homogeneous reaction free basic aqueous bath have a zincblen de crystal structure where reflections from (111), (200), (220), and (311) planes are clearly identified. RES, Raman, and photoconductivity confirm th e high stoichiometry and excellent structural properties with low optically active trap state density of single and continuous dip CdS films. However, they collectively suggest that multiple dip CdS films suffer from defects that act as carrier traps and lead to prolong photoconductivity decay in th ese films. (C) 2000 Elsevier Science S.A. All rights reserved.