Optical and structural differences between RF and DC AlxNy magnetron sputtered films

AlN films have been deposited by RF (1.78 MHz) and DC reactive magnetron sp uttering (argon and nitrogen) on glass substrates at low temperatures (< 15 0 degrees C) and with 16, 21 and 30% nitrogen ratios. We have found optical ly and structurally distinguishable characteristics for films (both opaque and transparent), obtained using these two experimental methods. We suggest that these differences are due to plasma effects in the substrate during g rowth, resulting from the different ionic bombardment rates of the two sput tering modes. (C) 2000 Elsevier Science S.A. All rights reserved.