Induced HSiCl emission in the UV photodissociation of 2-chloroethenylsilane

The laser induced fluorescence of the HSiCl radical, detected in the 525-60 0 nm range, has been observed in the photolysis of 2-chloroethenylsilane at 193 and 212 nm. The results indicate that this radical is produced with co nsiderable rotational and vibrational excitation in the electronic ground s tate. Quenching with Argon of the excited electronic state A(1)A" is very s low, on the order of 8 x 10(-13) cm(3) molecule(-1) s(-1). The implications of these observations for the primary photofragmentation paths of the 2-ch loroethenylsilane molecule are discussed. (C) 2000 Elsevier Science B.V. Al l rights reserved.