AlGaN/GaN heterojunction bipolar transistors grown by metal organic chemical vapour deposition

Citation
Bs. Shelton et al., AlGaN/GaN heterojunction bipolar transistors grown by metal organic chemical vapour deposition, ELECTR LETT, 36(1), 2000, pp. 80-81
Citations number
12
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
ELECTRONICS LETTERS
ISSN journal
00135194 → ACNP
Volume
36
Issue
1
Year of publication
2000
Pages
80 - 81
Database
ISI
SICI code
0013-5194(20000106)36:1<80:AHBTGB>2.0.ZU;2-I
Abstract
Heterojunction bipolar transistors based on aluminium gallium nitride/galli um nitride (AlGaN/GaN) structures have been fabricated and characterised. T he devices were grown by metal organic chemical vapour deposition on e-plan e sapphire substrates. The Npn structure consists of an n-GaN layer followe d by an n(+)-GaN subcollector contact, an unintentionally doped GaN collect or, p-GaN base, and an N-Al(0.1)G(0.9)N emitter with n(+)-GaN contact. Devi ces yielded good transistor performance with a DC current gain as high as 1 00 at room temperature.