Charge deposition modeling of thermal neutron products in fast submicron MOS devices

Citation
Xw. Zhu et al., Charge deposition modeling of thermal neutron products in fast submicron MOS devices, IEEE NUCL S, 46(6), 1999, pp. 1378-1385
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
ISSN journal
00189499 → ACNP
Volume
46
Issue
6
Year of publication
1999
Part
1
Pages
1378 - 1385
Database
ISI
SICI code
0018-9499(199912)46:6<1378:CDMOTN>2.0.ZU;2-V
Abstract
Ground-based thermal neutron reaction products (a, Li-7) appear to be an im portant terrestrial SEE concern for modern submicron technologies. We addre ss some interesting spatial and temporal characteristics of neutron product s. Accurate modeling of the temporal behavior of these products may be requ ired for high-speed devices. In addition, we introduce a simulation methodo logy that determines device sensitivity to neutron reaction products as a f unction of neutron nuclear reaction location and the resulting ion track or ientation.