The process of H+ diffusion in SiO2 is studied using first principles densi
ty-functional theory. This is done by examining stable bonding sites, migra
tion pathways, and barrier heights of H+ in alpha-quartz. The H+ is found t
o bind to the bridging oxygen site in a variety of ways, but always display
ing an attraction to neighboring oxygen atoms; This attraction provides a m
echanism for understanding the diffusion pathways and barrier heights for t
his system. The relative stability of H+ in SiO2 is also discussed in the c
ontext of transport.