Low dose rate (LDR) cobalt-60 (0.1 rad(Si)/s) gamma irradiated Silicon Germ
anium (SiGe) Heterojunction Bipolar Transistors (HBTs) were studied. Compar
isons were made with devices irradiated with 300 rad(Si)/s gamma radiation
to verify if LDR radiation is a serious radiation hardness assurance (RHA)
issue. Almost no LDR, degradation was observed in this technology up to 50
krad(Si). The assumption of the presence of two competing mechanisms is jus
tified by experimental results. At low total dose (less than or equal to 20
krad), an anomalous base current decrease was observed which is attributed
to self-annealing of deep-level traps to shallower levels. An increase in
base current at larger total doses is attributed to radiation induced gener
ation-recombination (G/R) center generation. Experiments on gate-assisted l
ateral PNP transistors and 2D numerical simulations using MEDICI were used
to confirm these assertions.