Growth of interfacial cracks in a TBC/superalloy system due to oxide volume induced internal pressure and thermal loading

Citation
Sq. Nusier et Gm. Newaz, Growth of interfacial cracks in a TBC/superalloy system due to oxide volume induced internal pressure and thermal loading, INT J SOL S, 37(15), 2000, pp. 2151-2166
Citations number
26
Categorie Soggetti
Mechanical Engineering
Journal title
INTERNATIONAL JOURNAL OF SOLIDS AND STRUCTURES
ISSN journal
00207683 → ACNP
Volume
37
Issue
15
Year of publication
2000
Pages
2151 - 2166
Database
ISI
SICI code
0020-7683(200004)37:15<2151:GOICIA>2.0.ZU;2-7
Abstract
Residual stresses develop in thermal barrier coating during cool down from processing temperature due to the thermal expansion mismatch between the di fferent layers e.g., substrate, bond coat, thermally grown oxide, and TBC. These residual stresses can initiate microcracks at the bond coat/TGO/TBC i nterfaces and can lead to debonding at the bond coat/TGO/TBC interfaces. Cr ack like flaws at the interface can be responsible for initiating debonding and accelerating the oxidation process. Effect of oxidation growth between bond coat and ceramic layer (TBC) can be modeled as volume increase. In th is part of the investigation, we represent this change in volume as an indu ced pressure across the crack faces. The energy release rate G, for both Mo de I and Mode II cases were evaluated using the virtual crack extension met hod. The specimen was cooled down from processing temperature of 1025-25 de grees C. The variation of the properties as a function of temperature were used for analysis. A four layer model which includes the TGO layer was anal yzed using the finite element method, two cases were considered. Case one i s a specimen with a crack at middle of the oxide layer (TGO) while case 2 i s a specimen with an interface crack between bond coat and TGO layers. Also , for both cases, a sensitivity study for the effect of variation of materi als properties (+/-25%) was undertaken using the finite element method. (C) 2000 Elsevier Science Ltd. All rights reserved.