Diagnostics of chlorine inductively coupled plasmas. Measurement of electron temperatures and electron energy distribution functions

The goal of the study that begins with this paper is the creation of a base set of parameters (densities and temperatures or energy distributions of a ll charged and neutral species) in a chlorine transformer-coupled plasma, m easured with the same commercial plasma source over an extensive range of p ressure and power. Electron temperatures T-e and electron energy distributi on functions (EEDFs) are reported as a function of pressure (1-20 mTorr) an d power (10-1000 W) during slow etching of SiO2-covered Si wafers. T-e valu es are obtained both by trace rare gases optical emission spectroscopy and Langmuir probe methods. EEDFs are obtained with the Langmuir probe. A zero- dimensional (global) model with revised rate coefficients is used to comput e T-e from both minimum (pressure, total plasma density, gas temperature, a nd wall recombination coefficient) and maximum (all experimentally measured parameters necessary to calculate T-e) sets of input parameters. (C) 2000 American Institute of Physics. [S0021-8979(00)06304-0].