Optimization of emitter cap growth conditions for InGaP/GaAs HBTs with high current gain by LP-MOCVD

Citation
Q. Yang et al., Optimization of emitter cap growth conditions for InGaP/GaAs HBTs with high current gain by LP-MOCVD, J ELEC MAT, 29(1), 2000, pp. 75-79
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
29
Issue
1
Year of publication
2000
Pages
75 - 79
Database
ISI
SICI code
0361-5235(200001)29:1<75:OOECGC>2.0.ZU;2-8
Abstract
The effect of emitter cap growth conditions on the common-emitter current g ain of InGaP/GaAs HBTs, grown by LP-MOCVD, has been studied. This work show s that the material quality of a carbon-doped base is highly dependent on t he emitter cap growth. The emitter cap growth effectively serves as a sourc e of thermal stress. This stress on the base during the emitter and cap gro wth causes the formation of carbon-related defects in the base that increas e the base recombination and reduces the current gain. Atomic force microsc opy is used to identify these carbon-related defects. Gain improvements of about 40% have been achieved by optimizing the emitter cap growth condition s to reduce the thermal stress.