MOVPE growth of AlGaInP layers on GaAs and Ge have been demonstrated. The s
urface morphology of the epilayers was smooth under optimized growth condit
ions. The epilayers showed good PL intensity on both GaAs and Ge substrates
. It has been observed that at room temperature the PL intensity drops in t
he first few seconds after excitation and attains a steady state. The Zn-do
ped AlGaInP did not show any signs of H-passivation. The MQW LEDs on both t
he substrates produced electroluminescence which increased with applied cur
rent. Results indicate the feasibility of AlGaInP LEDs on Ge.