MOVPE growth of (Al,Ga)InP-based laser structures monitored by real-time reflectance anisotropy spectroscopy

Citation
K. Haberland et al., MOVPE growth of (Al,Ga)InP-based laser structures monitored by real-time reflectance anisotropy spectroscopy, J ELEC MAT, 29(1), 2000, pp. 94-98
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
29
Issue
1
Year of publication
2000
Pages
94 - 98
Database
ISI
SICI code
0361-5235(200001)29:1<94:MGO(LS>2.0.ZU;2-5
Abstract
Using a specially-designed spectrometer enabling combined reflectance aniso tropy spectroscopy (IRAS) and reflectance measurements on rotating substrat es in a commercial MOVPE reactor, we report the first full-spectroscopic RA S-monitoring of(Al,Ga)InP-based 650 nm laser growth. First, a spectral data base was built up from systematic studies of AlGaInP RAS signatures for dif ferent Al compositions, doping levels and growth temperatures. These data a re subsequently used for the interpretation of characteristic RAS fingerpri nts taken throughout the entire laser growth process. From the analysis of characteristic changes in the RAS spectra even small deviations from the op timum process (doping levels, composition, etc.) which would effect the per formance of the final device can be detected.