Comparison of magnetic properties of ultrathin Co/Si(111) and Co/Ag/Si(111) films

Authors
Tsay, JS Yao, YD Lieu, Y Lee, SF Yang, CS
Citation
Js. Tsay et al., Comparison of magnetic properties of ultrathin Co/Si(111) and Co/Ag/Si(111) films, J MAGN MAGN, 209(1-3), 2000, pp. 208-210
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
209
Issue
1-3
Year of publication
2000
Pages
208 - 210
Database
ISI
SICI code
0304-8853(200002)209:1-3<208:COMPOU>2.0.ZU;2-M
Abstract
The thermal stability of the magnetization of the Co/Ag/Si(1 1 1) film is l ower than that of the Co/Si(1 1 1) film. From Auger electron spectroscopy, we demonstrate that Ag atoms in the Co/Ag/Si(1 1 1) film segregate to top l ayers below 350 K. The segregation of Ag atoms improves the diffusion of Co into Si (1 1 1) substrate, Annealing 10.5 ML Co/Si(1 1 1) film causes the easy axis of magnetization to transform from an in-plane to a cant out-of-p lane. The in-plane magnetization of 10.5 ML in Co/Ag/Si(1 1 1) film persist s after annealing. (C) 2000 Elsevier Science B.V. All rights reserved.