Non-stoichiometry, electrical conductivity and defect structure of hyper-stoichiometric UO2+x at 1000 degrees C

Citation
Sh. Kang et al., Non-stoichiometry, electrical conductivity and defect structure of hyper-stoichiometric UO2+x at 1000 degrees C, J NUCL MAT, 277(2-3), 2000, pp. 339-345
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
JOURNAL OF NUCLEAR MATERIALS
ISSN journal
00223115 → ACNP
Volume
277
Issue
2-3
Year of publication
2000
Pages
339 - 345
Database
ISI
SICI code
0022-3115(200002)277:2-3<339:NECADS>2.0.ZU;2-V
Abstract
The oxygen non-stoichiometry (x) and electrical conductivity (sigma) of hyp er-stoichiometric UO2+x have been measured as a function of partial pressur e (Po-2) at 1000 degrees C by a solid-state coulometric titration technique and a dc 4-probe method, respectively. Both of the properties were found t o be proportional to P-O2(1/2) at the high oxygen partial pressure regime, and P-O2(1/5) at the low oxygen partial pressure regime. These P-O2-depende ncies of the non-stoichiometry and the electrical conductivity are well exp lained with the (2:2:2) cluster model: (2O(i)(a)2O(i)(h)2V(O))' and (2O(i)( a)2O(i)(h)2V(O))"" are predominant at high and low P-O2, respectively. The electron-hole mobility of at 1000 degrees C has been determined by the comb ination of the non-stoichiometry and electrical conductivity combined on th e basis of the (2:2:2) cluster model. (C) 2000 Elsevier Science B.V. All ri ghts reserved.