Sh. Kang et al., Non-stoichiometry, electrical conductivity and defect structure of hyper-stoichiometric UO2+x at 1000 degrees C, J NUCL MAT, 277(2-3), 2000, pp. 339-345
The oxygen non-stoichiometry (x) and electrical conductivity (sigma) of hyp
er-stoichiometric UO2+x have been measured as a function of partial pressur
e (Po-2) at 1000 degrees C by a solid-state coulometric titration technique
and a dc 4-probe method, respectively. Both of the properties were found t
o be proportional to P-O2(1/2) at the high oxygen partial pressure regime,
and P-O2(1/5) at the low oxygen partial pressure regime. These P-O2-depende
ncies of the non-stoichiometry and the electrical conductivity are well exp
lained with the (2:2:2) cluster model: (2O(i)(a)2O(i)(h)2V(O))' and (2O(i)(
a)2O(i)(h)2V(O))"" are predominant at high and low P-O2, respectively. The
electron-hole mobility of at 1000 degrees C has been determined by the comb
ination of the non-stoichiometry and electrical conductivity combined on th
e basis of the (2:2:2) cluster model. (C) 2000 Elsevier Science B.V. All ri
ghts reserved.