Ms. Wooldridge et al., Quantitative evaluation of vibrational excitation of SiO A(1)Pi-X-1 Sigma(+) flame emission from a silane/hydrogen/oxygen/argon diffusion flame, J QUAN SPEC, 64(6), 2000, pp. 573-584
Citations number
22
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER
Spontaneous emission spectra in the wavelength range from 200 to 420 nm fro
m a SiH4/H-2/O-2/Ar diffusion flame (used for the synthesis of nanosized pa
rticles) were obtained. Si, SIH and SiO intermediates were identified from
the spectral emission signature. Emission from the SiO A(1)Pi-X(1)Sigma(+)
transition was analyzed in detail. Comparison of the experimental data with
an emission model for SiO indicated significant vibrational non-equilibriu
m. The level of vibrational excitation was quantified in terms of a vibrati
onal temperature independent of a translational temperature, The best-fit m
odel results obtained by comparison with the experimental data, yielded a t
ranslational temperature of T-trans = 3250 +/- 500 K and a vibrational temp
erature of T-vib = 15 000 +/- 5000 K for high oxygen concentration systems.
The vibrational temperature corresponds to an energy equivalent of similar
to 29 kcal/mol and changes in fractional population of over an order of ma
gnitude from equilibrium distributions for some vibrational levels. For low
oxygen concentration systems, the vibrational temperature was significantl
y higher T-vib = 40000 +/- 15000 K, which indicates a different SiO formati
on mechanism is active for these conditions. (C) 1999 Elsevier Science Ltd.
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