Vd. Papachristos et al., Effect of annealing on the structure and hardness of Ni-P-W multilayered alloy coatings produced by pulse plating, MAT SCI E A, 279(1-2), 2000, pp. 217-230
Ni-P-W multilayered alloy coatings were deposited on copper foils by pulse
plating, using a rotating cylinder electrode. They consisted of layers of h
igh (Ni-5 wt.% P-35 wt.% W) and low (Ni-8 wt.% P-15 wt.% W) W content. The
wavelengths studied were 8, 40 and 300 nm and the total thickness of the co
atings was approximately 25 mu m. The multilayered coatings were annealed i
n the temperature range between 200 and 800 degrees C and the effect of ann
ealing on their structure was studied by using X-ray diffraction, cross-sec
tional transmission electron microscopy equipped:with selected area electro
n diffraction facility, and differential thermal analysis. The initially am
orphous multilayered coatings crystallise in steps as the annealing tempera
ture increases (first the low-W crystallise layers and then the high-W laye
rs), and the layered structure is lost around 600 degrees C. The main cryst
alline phases formed during annealing are Ni-W solid solution and Ni3P. The
wavelength of the coatings seems to affect the onset temperature of the cr
ystallisation processes. The hardness of the coatings initially increases r
eaching a maximum in the 500-600 degrees C range, and then decreases as the
annealing temperature increases. (C) 2000 Elsevier Science S.A. All rights
reserved.