Two-dimensional plasma reactor simulation with self-consistent coupling ofgas flow with plasma transport

Citation
Sk. Nam et al., Two-dimensional plasma reactor simulation with self-consistent coupling ofgas flow with plasma transport, MAT SC S PR, 2(3), 1999, pp. 271-279
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
ISSN journal
13698001 → ACNP
Volume
2
Issue
3
Year of publication
1999
Pages
271 - 279
Database
ISI
SICI code
1369-8001(199910)2:3<271:TPRSWS>2.0.ZU;2-J
Abstract
A two-dimensional (2-D) fluid simulation applicable to high density plasma reactors was developed which couples gas How with plasma transport in a sel f-consistent manner. Modified boundary conditions were used at the reactor walls to accommodate transport at low pressures. A modular approach circumv ented the disparity in time scales and a quasi-neutral plasma assumption ov ercame the disparity in length scales. This approach allowed for a simulati on tool that can execute rapidly on a desktop computer, and is, therefore, suitable for Technology Computer-Aided Design (TCAD). Simulation results fo r an electron cyclotron resonance (ECR) plasma system showed good agreement with experimental data on electron density and temperature as a function o f plasma power and pressure. Also. the gas pressure drop in the reactor was predicted correctly by the simulation. Further simulation studies showed t he effect of power and pressure on ion flux uniformity on a wafer substrate . (C) 1999 Elsevier Science Ltd. All rights reserved.