Al-Co reactions in multilayer films: first stages and selective formation of new (metastable) phases

Citation
E. Emeric et al., Al-Co reactions in multilayer films: first stages and selective formation of new (metastable) phases, MICROEL ENG, 50(1-4), 2000, pp. 285-290
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
50
Issue
1-4
Year of publication
2000
Pages
285 - 290
Database
ISI
SICI code
0167-9317(200001)50:1-4<285:ARIMFF>2.0.ZU;2-3
Abstract
Reactive diffusion in Al/Co multilayers has been analyzed using differentia l scanning calorimetry, ramped resistance measurements and X-ray diffractio n. Two major points appear. (1) the first phase formed is AI,Co,. This is i n agreement both with the Cu,Au rule on phase selection and former studies on Al/Co bilayer films. However, we show that the formation of this phase p roceeds in two distinct steps. The first one is limited to a thin interfaci al layer. The second is the diffusion-controlled growth of this layer until total consumption of Al. The second phase formed is the metastable decagon al Al13Co4 quasicrystal, It is observed for Al/Co ratios ranging from 13/4 to 5/2. In this composition range several stable phases are reported. React ive diffusion in multilayers appear thus as a very powerful tool to promote selective formation of new (metastable) phases. (C) 2000 Elsevier Science B.V. All rights reserved.