A model describing stresses and vacancy system evolution and also drift phe
nomena caused by electromigration (EM) in metal interconnectors has been pr
oposed. It is shown that the drift kinetics has three main stages, i.e., in
duction period, quasi-stationary and stationary state. Induction period is
characterised by an increase in the stress at the ends of a conductor; drif
t is absent. Drift begins when the yield limit is achieved at the cathode e
dge of the conductor. Drift rate increases, reaches a maximum and then decr
eases down to the stationary value. Characteristic times for all the stages
are determined. Also, the effect of the length of the conductor on drift k
inetics is analysed. (C) 2000 Elsevier Science B.V. All rights reserved.