Nonradiative electron-hole recombination by a low-barrier pathway in hydrogenated silicon semiconductors

Citation
Sb. Zhang et Hm. Branz, Nonradiative electron-hole recombination by a low-barrier pathway in hydrogenated silicon semiconductors, PHYS REV L, 84(5), 2000, pp. 967-970
Citations number
27
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
84
Issue
5
Year of publication
2000
Pages
967 - 970
Database
ISI
SICI code
0031-9007(20000131)84:5<967:NERBAL>2.0.ZU;2-8
Abstract
A microscopic pathway for nonradiative electron-hole recombination by large structural reconfiguration in hydrogenated Si is found with first-principl es calculations. Trapped-biexciton formation leads to a low-barrier reconfi guration of the H atom, accompanied by crossing of doubly occupied electron and hole levels in the band gap. This crossing represents the nonradiative recombination of the carriers, without multiphonon emission. The proposal provides a mechanism for carrier-induced H emission during metastable degra dation of hydrogenated amorphous silicon.